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Ion Implantation and Beam Procesing Edited by J S Wiliams and J M Poate

Contributor(s): Poate, J M [Editor] | Williams, J S [Author]Material type: Text

TextLanguage: ENG Publication details: Haryana Academic Press 1984Edition: Description: xi,419pISBN: 0127569804Subject(s): ElectronicsDDC classification: 621.38152

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Item type	Current library	Call number	Status	Date due	Barcode
Books	Bangalore University Library DL	621.38152 WIL P (Browse shelf (Opens below))	Available		249160

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Previous	621.38152 SZE Semiconductor devices; Physics and Technology	621.38152 SZE Semiconductor devices; Physics and Technology	621.38152 TYA Introduction to Semiconductor Materials and devices	621.38152 WIL P Ion Implantation and Beam Procesing	621.38152 WOL Semiconductors	621.381528 TSI Operation and Modeling of the Mos Transistor	621.3815287 SUB Thyristor Control of Electric Drives	Next

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